Respiratory Protection

Filters are intended for use with panoramic masks of MAG series. Filters are used to protect from gases, vapors and mixtures of these substances and particles in order to reduce their harmful effects on the human respiratory system.

Filters are intended for use with panoramic masks of MAG series. Filters are used to protect from gases, vapors and mixtures of these substances and particles in order to reduce their harmful effects on the human respiratory system.

Filters are intended for use with panoramic masks of MAG series. Filters are used to protect from gases, vapors and mixtures of these substances and particles in order to reduce their harmful effects on the human respiratory system.

Filters are intended for use with panoramic masks of MAG series. Filters are used to protect from gases, vapors and mixtures of these substances and particles in order to reduce their harmful effects on the human respiratory system.

Filters are intended for use with panoramic masks of MAG series. Filters are used to protect from gases, vapors and mixtures of these substances and particles in order to reduce their harmful effects on the human respiratory system.

Filters are intended for use with panoramic masks of MAG series. Filters are used to protect from gases, vapors and mixtures of these substances and particles in order to reduce their harmful effects on the human respiratory system.

Filters are intended for use with panoramic masks of MAG series. Filters are used to protect from gases, vapors and mixtures of these substances and particles in order to reduce their harmful effects on the human respiratory system.

UNIX series filters with bayonet connection are designed to clean the inhaled air from harmful vaporous and gaseous substances and particles as part of full face masks and half-masks of UNIX series. Filters are applied when the volume content of oxygen in the air is not less than 17%.

Particle filter UNIX 223 P3 R D with additional protection from organic gases and vapors up to 1 PEL is used as part of UNIX filtering masks or respirators with an oxygen content of at least 17% by volume.